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机译:非晶Ge掺杂HfO_x薄膜的电荷存储特性和隧穿机理
School of Physical Science and Technology, Southwest University, Chongqing 400715, China;
School of Physical Science and Technology, Southwest University, Chongqing 400715, China;
School of Physical Science and Technology, Southwest University, Chongqing 400715, China;
School of Physical Science and Technology, Southwest University, Chongqing 400715, China;
School of Physical Science and Technology, Southwest University, Chongqing 400715, China;
School of Physical Science and Technology, Southwest University, Chongqing 400715, China;
Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong, China;
机译:可见光增强的无定形Ni掺杂HFO2薄膜的电荷存储特性
机译:可见光增强的无定形Ni掺杂HFO2薄膜的电荷存储特性
机译:掺amorphous非晶硅膜中金属诱导的纳米晶的电荷存储特性
机译:nc-RuO嵌入式ZrHfO高k膜中电荷存储的机理
机译:在非晶硅隧道薄壁中通过局部化状态进行隧穿和传输,以及这些屏障在超导钒镓合金薄膜(共振,APB逼近,跃迁,弹性)的隧穿研究中的应用。
机译:非晶TaNx薄膜中的电荷传输机制和存储效应
机译:非晶Ge掺杂HfOx薄膜的电荷存储特性和隧穿机理
机译:氢化非晶硅合金薄膜的生长机理和表征。最终分包合同报告,1991年2月15日至1994年4月14日