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机译:热钛靶磁控溅射过程中氩气压力和电流密度对衬底温度的影响
Lappeenranta University of Technology, Skinnarilankatu 34, 53850 Lappeenranta, Finland;
Department of Physical Electronics and Technology, St. Petersburg Electrotechnical University, 5 Prof. Popov St., St. Petersburg 197376, Russia;
Department of Physical Electronics and Technology, St. Petersburg Electrotechnical University, 5 Prof. Popov St., St. Petersburg 197376, Russia;
Department of Physical Electronics and Technology, St. Petersburg Electrotechnical University, 5 Prof. Popov St., St. Petersburg 197376, Russia;
Magnetron sputtering; Titanium; Hot target; Substrate heating;
机译:氩气气压对磁控溅射室温下沉积在柔性TPT衬底上的ZnO:Al膜的影响
机译:衬底温度和氧气/氩气流量比对射频磁控溅射制备的掺杂Ga的ZnO薄膜的电和光学性能的影响
机译:衬底温度和氧/氩流量比对射频磁控溅射制备的GZO薄膜的电学和光学性能的影响
机译:氩气压力和衬底温度对磁控溅射SmCo薄膜磁性能的影响
机译:通过磁控溅射合成的二硼化钛/碳化钛和氧化钛/氧化铝多层涂层的结构,机械,摩擦学性能和高温稳定性。
机译:射频磁控溅射法生长的锗量子点与衬底温度相关的表面形貌和光致发光
机译:直流磁控溅射衬底温度对巨磁结构上的基板温度控制的影响及Fe 2.45 sum> Sm合金薄膜的易感性