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Fundamental band gap and direct-indirect crossover in Ge1-x-ySixSny alloys

机译:Ge1-x-ySixSny合金的基本带隙和直接-间接交叉

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摘要

The Ge-like indirect band gap of Ge1-x-ySixSny alloys has been determined over an extended y > x range using photoluminescence spectroscopy from films grown on Ge-buffered Si substrates. It is found that the compositional dependence of this transition can be fit with a bilinear expression of the form (in eV): Eind=0.668±0.008+0.67±0.15x-1.77±0.16y. These energies are significantly below the prediction from a simple linear interpolation between Si, Ge, and α-Sn, revealing a large negative bowing in the compositional dependence similar to that found earlier for direct transitions. The direct-indirect crossover boundary is found to lie along the compositional line y = (0.062 ± 0.014) + (0.76 ± 0.23)x, which in the limit x → 0 agrees with earlier results for the binary Ge1-ySny alloy.
机译:Ge1-x-ySixSny合金的类Ge间接带隙已使用在Ge缓冲的Si衬底上生长的薄膜的光致发光光谱法在扩展的y> x范围内确定。发现该过渡的组成依赖性可以与形式(以eV为单位)的双线性表达相符:Eind = 0.668±0.008 + 0.67±0.15x-1.77±0.16y。这些能量显着低于Si,Ge和α-Sn之间简单线性插值的预测,揭示出与先前直接过渡相似的大的负弓形弯曲。发现直接-间接交叉边界沿着组成线y =(0.062±0.014)+(0.76±0.23)x,在极限x→0内与二元Ge1-ySny合金的早期结果一致。

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  • 来源
    《Applied Physics Letters》 |2013年第20期|1-5|共5页
  • 作者单位

    Department of Physics, Arizona State University, Tempe, Arizona 85287-1504, USA|c|;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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