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Carrier transport in graphite/Si3N4-nanobelt/PtIr Schottky barrier diodes

机译:石墨/ Si 3 N 4 -纳米烯烃/ PtIr肖特基势垒二极管中的载流子传输

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摘要

Understanding the roles of contacts and interfaces between metals and semiconductors is critically important for exploring nanostructure-based nanodevices. The present study shed some light on the dominated mechanism of size-dependent carrier transfer in the Schottky barrier diodes configured by the Pt-Ir/SiN-nanobelt/graphite (metal-semiconductor-metal (MSM)) sandwiched structure via a conductive atomic force microscopy using nanobelts with various thicknesses. The observed I-V behaviors suggested that the charge transports under the low and high biases were dominated by the reverse-biased Schottky barrier and space-charge-limited current (SCLC), respectively. The intermediate region between the low and high biases presented the transition between the Ohmic and SCLC behaviors, in which the ≡Si and =N dangling bonds acted as the defects within the SiN nanobelt surface are predominant in the charge transfer.
机译:了解金属和半导体之间的接触和界面的作用对于探索基于纳米结构的纳米器件至关重要。本研究揭示了由Pt-Ir / SiN-纳米/石墨(金属-半导体-金属(MSM))夹心结构通过导电原子力构成的肖特基势垒二极管中尺寸依赖的载流子转移的主导机理显微镜使用各种厚度的纳米带。观察到的I-V行为表明,在低偏置和高偏置下的电荷传输分别受反向偏置的肖特基势垒和空间电荷限制电流(SCLC)的支配。低偏压和高偏压之间的中间区域表现出欧姆行为和SCLC行为之间的过渡,其中≡Si和= N悬空键充当SiN纳米带表面内的缺陷,在电荷转移中占主导地位。

著录项

  • 来源
    《Applied Physics Letters》 |2014年第19期|1-5|共5页
  • 作者单位

    Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan City 030024, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-17 13:10:37

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