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Hydrogen-doping stabilized metallic VO2 (R) thin films and their application to suppress Fabry-Perot resonances in the terahertz regime

机译:氢掺杂稳定的金属VO2(R)薄膜及其在太赫兹制中抑制Fabry-Perot共振的应用

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We demonstrate that catalyst-assisted hydrogen spillover doping of VO2 thin films significantly alters the metal-insulator transition characteristics and stabilizes the metallic rutile phase at room temperature. With hydrogen inserted into the VO2 lattice, high resolution X-ray diffraction reveals expansion of the V-V chain separation when compared to the VO2(R) phase. The donated free electrons, possibly from O-H bond formation, stabilize the VO2(R) to low temperatures. By controlling the amount of dopants to obtain mixed insulating and metallic phases, VO2 resistivity can be continuously tuned until a critical condition is achieved that suppresses Fabry-Perot resonances. Our results demonstrate that hydrogen spillover is an effective technique to tune the electrical and optical properties of VO2 thin films.
机译:我们证明,VO2薄膜的催化剂辅助氢溢出掺杂大大改变了金属-绝缘体的过渡特性,并在室温下稳定了金红石相。与VO2相相比,将氢插入VO2晶格后,高分辨率X射线衍射揭示了V-V链间距的扩大。可能来自O-H键形成的自由电子将VO2(R)稳定在低温下。通过控制掺杂剂的量以获得混合的绝缘相和金属相,可以连续调整VO2电阻率,直到达到抑制Fabry-Perot共振的临界条件为止。我们的结果表明,氢气溢出是一种有效的技术,可调节VO2薄膜的电学和光学特性。

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