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C-N-codoped Sb_2Te_3 chalcogenides for reducing writing current of phase-change devices

机译:用于减少相变装置的写入电流的C-N型编号SB_2TE_3硫属化物

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摘要

In this work, doping C and codoping C and N into the Sb_2Te_3 traditional chalcogenide were investigated to reduce the writing current of the phase-change device using a chalcogenide as the active medium. No face-centered-cubic (FCC) structure was observed in the C-doped Sb_2Te_3 film, while it appeared after codoping C and N into Sb_2Te_3. The FCC crystallite size greatly reduced from 6.5 to 3.5-3.8 nm after codoping. In particular, the resistivity of FCC C-N codoped Sb_2Te_3 was about two orders of magnitude higher than that of Sb_2Te_3. The effect of the property of the chalcogenide on the writing current of the phase-change device was analyzed by the finite element method. The analysis showed that the writing current of the device using C-N-codoped Sb_2Te_3 as the active medium can significantly drop to about 1/8 of that of the Sb_2Te_3 based one.
机译:在该工作中,研究了掺杂C和COPOPING C和N进入SB_2TE_3传统的硫属化物,以减少使用硫属化物作为活性培养基的相变装置的写入电流。在C掺杂的SB_2TE_3膜中没有观察到朝向立方(FCC)结构,同时在将C和N中的CO和N中出现在SB_2TE_3之后出现。 CCC晶体尺寸在重致后从6.5到3.5-3.8nm大大降低。特别地,FCC C-N编码的SB_2TE_3的电阻率大约比SB_2TE_3高约两个数量级。通过有限元法分析了硫属化物质对相变装置的写入电流的影响。该分析表明,使用C-N-划分的SB_2TE_3作为活性介质的装置的写入电流可以显着下降到基于SB_2TE_3的1/8的1/8。

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  • 来源
    《Applied Physics Letters》 |2020年第15期|153502.1-153502.7|共7页
  • 作者单位

    Division of Electronics and Informatics Gunma University 1-5-1 Tenjin Kiryu Gunma 376-8515 Japan;

    Division of Electronics and Informatics Gunma University 1-5-1 Tenjin Kiryu Gunma 376-8515 Japan;

    Division of Electronics and Informatics Gunma University 1-5-1 Tenjin Kiryu Gunma 376-8515 Japan;

    School of Materials Science and Engineering Jiangsu University of Science and Technology Zhenjiang 212003 People's Republic of China;

    College of Electrical Engineering Zhejiang University Hangzhou 130025 People's Republic of China;

    School of Materials and Energy University of Electronic Science and Technology of China Chengdu 611731 People's Republic of China;

    State Key Laboratory of Electronic Thin Films and Integrated Cells University of Electronic Science and Technology of Chi Chengdu 610051 People's Republic of China;

    State Key Laboratory of Electronic Thin Films and Integrated Cells University of Electronic Science and Technology of Chi Chengdu 610051 People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 22:18:05

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