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High-frequency current oscillations in charge-density-wave 1T-TaS_2 devices: Revisiting the 'narrow band noise' concept

机译:充电密度波1T-TAS_2设备中的高频电流振荡:重新探测“窄带噪声”概念

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摘要

"We report on the current oscillations in quasi-2D 1T-TaS_2 charge-density-wave two-dimensional devices. The MHz-frequency range of the oscillations and the linear dependence of the frequency of the oscillations on the current closely resemble the narrow band noise, which was often observed in the classical bulk quasi-1D trichalcogenide charge-density-wave materials. In bulk quasi-1D materials, the narrow band noise was interpreted as direct evidence of charge-density-wave sliding. Despite the similarities, we argue that the nature of the MHz oscillations in 1T-TaS_2 is different from the narrow band noise. Analysis of the biasing conditions and current indicates that the observed oscillations are related to the current instabilities due to the voltage-induced transition from the nearly commensurate to incommensurate charge-density-wave phase.
机译:“我们报告了准2D 1T-TAS_2充电密度波二维器件中的当前振荡。振荡的MHz频率范围和振荡频率的线性依赖性电流与窄带非常类似于窄带噪声经常观察到经典散装Quasi-1d三氯乙烯电荷密度波材料。在散装准1D材料中,窄带噪声被解释为电荷密度波滑动的直接证据。尽管存在相似之处,但我们争辩说,1T-Tas_2中的MHz振荡的性质与窄带噪声不同。偏置条件和电流的分析表明观察到的振荡由于来自几乎相应的电压引起的过渡而导致的电流不稳定性有关。加密电荷密度波相。

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  • 来源
    《Applied Physics Letters》 |2020年第16期|163101.1-163101.5|共5页
  • 作者单位

    Nano-Device Laboratory (NDL) and Phonon Optimized Engineered Materials (POEM) Center Department of Electrical and Computer Engineering University of California Riverside California 92521 USA Intel Corporation Hillsboro Oregon USA;

    Nano-Device Laboratory (NDL) and Phonon Optimized Engineered Materials (POEM) Center Department of Electrical and Computer Engineering University of California Riverside California 92521 USA Center for Terahertz Research and Applications (CENTERA) Institute of High-Pressure Physics Polish Academy of Sciences Warsaw 01-142 Poland;

    Laboratory for Terascale and Terahertz Electronics (LATTE) Department of Electrical and Computer Engineering University of California Riverside California 92521 USA Intel Corporation Hillsboro Oregon USA;

    Laboratory for Terascale and Terahertz Electronics (LATTE) Department of Electrical and Computer Engineering University of California Riverside California 92521 USA;

    Nano-Device Laboratory (NDL) and Phonon Optimized Engineered Materials (POEM) Center Department of Electrical and Computer Engineering University of California Riverside California 92521 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 22:17:54

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