首页> 外文期刊>Applied Physics Letters >Tuning electrical properties and phase transitions through strain engineering in lead-free ferroelectric K_(0.5)Na_(0.5)NbO_3-LiTaO_3-CaZrO_3 thin films
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Tuning electrical properties and phase transitions through strain engineering in lead-free ferroelectric K_(0.5)Na_(0.5)NbO_3-LiTaO_3-CaZrO_3 thin films

机译:通过应变工程在无铅铁电K_(0.5)NA_(0.5)NBO_3-LIAO_3-Cazro_3薄膜中调节电性能和相位过渡

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摘要

The effects of epitaxial strain on the properties of 0.95(K0.49Na0.49Li0.02)(Ta0.2Nb0.8)O-3-0.05CaZrO(3) (KNNLT-CZ) thin films are investigated. La0.07Sr0.93SnO3 and SrRuO3 are used as bottom electrodes to provide in-plane tensile and compressive stress, respectively. Our results show that the La0.07Sr0.93SnO3-buffered KNNLT-CZ films are mostly strain-relaxed with an orthorhombic (O) and tetragonal (T) mixed phase and a tetragonality of 1.002, which have a twice remnant polarization (2P(r)) of 14.29 mu C/cm(2), an effective piezoelectric strain coefficient (d(33)*) of similar to 60 pm/V, and an O to T phase transition temperature (TO-T) of 140 degrees C, while the SrRuO3-buffered KNNLT-CZ films are only partially strain-relaxed with a pure O phase and a larger tetragonality of 1.011, resulting in an increased 2P(r) value of 33.63 mu C/cm(2), an improved d(33)* value of similar to 80 pm/V, and an enhanced TO-T value of 200 degrees C. Both films show a high Curie temperature above 380 degrees C and stable hysteresis loops from room temperature to 225 degrees C. These results highlight the feasibility to improve the performance of KNN-based materials via epitaxial strain.
机译:研究了外延应变对0.95(K0.49NA0.49LI0.02)(Ta0.2NB0.8)O-3-0.05己唑(3)(KNNLT-CZ)薄膜的影响。 LA0.07SR0.93SNO3和SRRUO3用作底部电极以提供面内拉伸和压缩应力。我们的结果表明,LA0.07SR0.93SNO3缓冲的KNNLT-CZ薄膜大多应变,具有正畸(O)和四边形(T)混合相和1.002的四角形,其具有两倍的残余极化(2p(r ))14.29 mu c / cm(2),具有类似于60μm/ v的有效压电菌株系数(d(33)*),以及140℃的o到t相变温度(to-t),虽然Srruo3缓冲的knnlt-Cz膜仅具有纯O相的部分应变 - 弛豫和1.011的较大四面,导致2p(r)值增加33.63μc/ cm(2),改进的d( 33)*类似于80 pm / v的值,增强至-t值为200℃。这两部薄膜显示出高于380℃的高居里温度,从室温到225℃稳定的滞后环。这些结果突出显示通过外延应变改善KNN基材料性能的可行性。

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  • 来源
    《Applied Physics Letters》 |2019年第20期|202901.1-202901.5|共5页
  • 作者单位

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

    Tsinghua Univ State Key Lab New Ceram & Fine Proc Sch Mat Sci & Engn Beijing 100084 Peoples R China;

    Tsinghua Univ State Key Lab New Ceram & Fine Proc Sch Mat Sci & Engn Beijing 100084 Peoples R China;

    Univ Sci & Technol China Dept Phys Chinese Acad Sci Hefei 230026 Anhui Peoples R China|Univ Sci & Technol China High Magnet Field Lab Chinese Acad Sci Hefei 230026 Anhui Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 22:17:51

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