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Random two-frame phase-shifting interferometry via minimization of coefficient of variation

机译:通过最小化变异系数的随机两帧相移干涉术

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摘要

Random two-frame phase-shifting interferometry (PSI) is an advanced technique to retrieve the phase information from as few as two interferograms with unknown phase steps. Because of the advantages of no requirement for accurate phase shifters and much less time for data acquisition and processing, random two-frame PSI is attracting more and more interest in fast and high-precision optical metrology. However, reconstructing the phase from only two interferograms is challenging because it is an ill-posed problem in essence, especially when the phase step is unknown. Although some solutions have been proposed for this problem to date, most of them require complicated preprocessing or special usage preconditions for interferograms to be demodulated. In this letter, we developed an elegant phase reconstruction method for random two-frame PSI, which is much different from frameworks of existing methods. In the proposed approach, the phase of random two-frame PSI can be accurately reconstructed using the phase step value which minimizes the coefficient of variation (CV) of the modulation term of interferograms. Sufficient numerical simulations and experimental data demonstrate the high accuracy and high efficiency of this CV minimization (CVM) method. Moreover, its performance is not limited by the number of fringes in interferograms, in contrast to existing state-of-the-art approaches. We anticipate extensive applications of the CVM method in random two-frame PSI in the future.
机译:随机两帧相移干涉术(PSI)是一种先进的技术,可从少至两个相位图未知的干涉图中检索相位信息。由于不需要精确的移相器,并且数据获取和处理所需的时间更少,因此,随机两帧PSI在快速和高精度光学计量学中引起了越来越多的兴趣。但是,仅从两个干涉图重建相位就具有挑战性,因为这本质上是一个不适定的问题,尤其是在相位步长未知的情况下。尽管迄今为止已经针对该问题提出了一些解决方案,但是大多数解决方案都需要复杂的预处理或特殊的使用前提才能对干涉图进行解调。在这封信中,我们为随机两帧PSI开发了一种优雅的相位重建方法,该方法与现有方法的框架有很大不同。在提出的方法中,可以使用相位步进值精确地重建随机两帧PSI的相位,该相位步进值可以最小化干涉图调制项的变异系数(CV)。足够的数值模拟和实验数据证明了这种CV最小化(CVM)方法的高精度和高效率。而且,与现有技术水平相反,其性能不受干涉图中条纹数量的限制。我们预计将来CVM方法将在随机两帧PSI中得到广泛应用。

著录项

  • 来源
    《Applied Physics Letters》 |2019年第12期|121107.1-121107.5|共5页
  • 作者单位

    CALTECH Div Engn & Appl Sci 1200 E Calif Blvd Pasadena CA 91125 USA;

    Zhejiang Univ Coll Opt Sci & Engn State Key Lab Modern Opt Instrumentat Hangzhou 310027 Zhejiang Peoples R China;

    Anhui Univ Key Lab Optoelect Informat Acquisit & Manipulat Minist Educ Hefei 230601 Anhui Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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