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Interwell carrier transport in InCaN/(In)CaN multiple quantum wells

机译:InCaN /(In)CaN多量子阱中的阱间载流子传输

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摘要

Uniform carrier distribution between quantum wells (QWs) of multiple QW light emitting diodes (LEDs) and laser diodes is important for the efficiency of device operation. In lasers, the uniform distribution ensures that all the QWs contribute to lasing; in LEDs, it enables high power operation with minimal Auger losses and a maximal efficiency. The carrier distribution between the QWs takes place via interwell (IW) transport. In polar GaN-based structures, the transport might be hindered by the strong carrier confinement and the internal electric fields. In this work, we study the IW transport in InGaN/(In)GaN multiple QW structures typical for ultraviolet-emitting devices with different well and barrier parameters. Experiments have been performed by means of time-resolved photoluminescence. We find that the IW transport rate is limited by the hole thermionic emission, which for InGaN/GaN QWs produces long transport times, similar to 1 ns per well, and a nonuniform IW carrier distribution. However, adding 5% In to the barriers completely changes the situation with the transport time decreasing by a factor of four and the hole thermionic emission energy from 200 meV to 70 meV. This study shows that using InGaN barriers is a promising pathway toward efficient high power InGaN LEDs. Published under license by AIP Publishing.
机译:多个QW发光二极管(LED)和激光二极管的量子阱(QW)之间的均匀载流子分布对于提高器件工作效率非常重要。在激光器中,均匀的分布可确保所有QW都可激发激光。在LED中,它可实现高功率运行,而俄歇损耗最小且效率最高。 QW之间的载波分配通过井间(IW)传输进行。在基于GaN的极性结构中,强载流子限制和内部电场可能会阻碍传输。在这项工作中,我们研究了具有不同阱和势垒参数的典型的InGaN /(In)GaN多个QW结构中的IW传输。已经通过时间分辨的光致发光进行了实验。我们发现IW传输速率受到空穴热电子发射的限制,这对于InGaN / GaN QWs产生长的传输时间,类似于每孔1 ns,并且IW载流子分布不均匀。但是,向势垒中添加5%In完全改变了这种情况,传输时间减少了四倍,空穴热电子发射能从200 meV降至70 meV。这项研究表明,使用InGaN势垒是通往高效大功率InGaN LED的有前途的途径。由AIP Publishing授权发布。

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  • 来源
    《Applied Physics Letters》 |2019年第15期|151103.1-151103.5|共5页
  • 作者单位

    KTH Royal Inst Technol, Dept Appl Phys, Electrum 229, S-16440 Kista, Sweden;

    KTH Royal Inst Technol, Dept Appl Phys, Electrum 229, S-16440 Kista, Sweden;

    Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA;

    Natl Taiwan Univ, Grad Inst Photon & Optoelect, Taipei 10617, Taiwan|Natl Taiwan Univ, Dept Elect Engn, Taipei 10617, Taiwan;

    Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA;

    Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA;

    Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 04:12:52

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