Superconducting nano Josephson junctions patterned with a focused helium ion beam

摘要

We report the fabrication of nanoscale wires and Josephson junctions in 25 nm thick YBa2Cu3O7-delta thin films with wire widths as narrow as 50 nm. Our approach utilizes a finely focused gas field ion source from a helium ion microscope to directly modify the material on the nanometer scale to convert irradiated regions of the film into insulators. In this manner, the film remains intact and no material is milled or removed. Transport data show that the electrical properties, critical current and conductance, scale linearly with the lithographically defined width ensuring that the actual and lithographically defined dimensions are commensurate with each other. Unlike in typical ion damage proximity effect Josephson junctions, we observe a low temperature saturation of the critical current and near temperature interdependent resistance which we attribute to a narrower and more resistive barrier. Furthermore, we also demonstrate the ability to fabricate devices exhibiting high resistance and capacitance with hysteretic underdamped Josephson junction properties. This patterning technique allows for a broad range of electrical properties for Josephson devices that will expand potential applications. Published by AIP Publishing.