首页> 外文期刊>Applied Physics Letters >Shallow electron traps formed by Gd~(2+) ions adjacent to oxygen vacancies in cerium-doped Gd_3Al_2Ga_3O_(12) crystals
【24h】

Shallow electron traps formed by Gd~(2+) ions adjacent to oxygen vacancies in cerium-doped Gd_3Al_2Ga_3O_(12) crystals

机译:掺铈的Gd_3Al_2Ga_3O_(12)晶体中与氧空位相邻的Gd〜(2+)离子形成的浅电子陷阱

获取原文
获取原文并翻译 | 示例
       

摘要

To clarify the origin of shallow electron traps in cerium-doped Gd3Al2Ga3O12 (Ce:GAGG), the optical properties of cerium-doped Lu3-xGdxAl2Ga3O12 crystals were investigated. Absorption spectra for x = 3 exhibited a prominent band at 12 000 cm(-1) when excited by 3.31-eV ultraviolet light. This band has been previously attributed to shallow electron traps at defect complexes associated with oxygen vacancies. When Gd3+ ions were replaced with Lu3+ ions, the 12 000cm(-1) band weakened and disappeared completely for Ce:Lu3Al2Ga3O12. In addition, thermally stimulated luminescence glow curves were observed. Optically stimulated luminescence indicated that the energy of the conduction band minimum did not change by the presence of Lu3+ ions. Thus, the Gd3+ ions were important for the formation of shallow electron traps in Ce:GAGG. First-principles calculations implied that Gd3+ ions responsible for shallow electron traps formed antisite defects at GAGG octahedral sites. Hence, defect complexes of antisite Gd2+ ions adjacent to oxygen vacancies were the most plausible candidates for shallow electron traps in Ce:GAGG. Published by AIP Publishing.
机译:为了阐明掺铈的Gd3Al2Ga3O12(Ce:GAGG)中浅电子陷阱的起源,研究了掺铈的Lu3-xGdxAl2Ga3O12晶体的光学性质。 x = 3的吸收光谱在被3.31-eV紫外光激发时在12000 cm(-1)处显示出一个突出的谱带。该带先前已归因于与氧空位有关的缺陷复合体处的浅电子陷阱。当Gd3 +离子替换为Lu3 +离子时,Ce:Lu3Al2Ga3O12的12000cm(-1)谱带减弱并完全消失。另外,观察到热刺激的发光辉光曲线。光学激发的发光表明,Lu3 +离子的存在不会改变导带最小能量。因此,Gd3 +离子对于在Ce:GAGG中形成浅电子陷阱很重要。第一性原理计算表明,负责浅电子陷阱的Gd3 +离子在GAGG八面体位点形成了反位缺陷。因此,与氧空位相邻的反位Gd2 +离子的缺陷络合物是Ce:GAGG中浅电子陷阱最合理的候选物。由AIP Publishing发布。

著录项

  • 来源
    《Applied Physics Letters》 |2018年第4期|041906.1-041906.4|共4页
  • 作者单位

    Yamagata Univ, Fac Sci, Yamagata 9908560, Japan;

    Nagoya Univ, Grad Sch Engn, Nagoya, Aichi 4648603, Japan;

    Tohoku Univ, New Ind Creat Hatchery Ctr, Sendai, Miyagi 9808579, Japan;

    Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan;

    Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan;

    Yamagata Univ, Fac Sci, Yamagata 9908560, Japan;

    Yamagata Univ, Fac Sci, Yamagata 9908560, Japan;

    Yamagata Univ, Fac Sci, Yamagata 9908560, Japan;

    Shizuoka Univ, Res Inst Elect, Hamamatsu, Shizuoka 4328011, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 04:09:28

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号