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Dependence of oxide thickness on O-2 pressure and experimental determination of Gibbs free energies of ultrathin oxide films in vacuum

机译:氧化物厚度与O-2压力的关系以及真空中超薄氧化物薄膜的吉布斯自由能的实验确定

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Ultrathin oxide films grown in a vacuum are important in many industrial processes, with the values of Gibbs free energies of the gas and films determining the oxide type that grows on a surface, and its thickness. A high-stability quartz-crystal microbalance is used to provide quantitative experimental data on these free energies, for the model case of oxidation of a lead film on a gold substrate. The surface oxide, PbO, forms a single molecular layer at 10(-6) Torr of O-2, but thickens abruptly to two layers at 1x10(-4) Torr, and becomes even thicker by 0.33 Torr. This is explained using film free energies. (C) 2004 American Institute of Physics.
机译:真空中生长的超薄氧化膜在许多工业过程中都很重要,气体和薄膜的吉布斯自由能的值决定了在表面生长的氧化物类型及其厚度。对于金衬底上的铅膜氧化的模型情况,使用高稳定性石英晶体微量天平提供有关这些自由能的定量实验数据。表面氧化物PbO在O-2的10(-6)托下形成单分子层,但在1x10(-4)托下突然增厚到两层,甚至更厚0.33托。这是使用薄膜自由能解释的。 (C)2004美国物理研究所。

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