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Pb_(0.3)Sr_(0.7)TiO_(3) thin films for high-frequency phase shifter applications

机译:用于高频移相器的Pb_(0.3)Sr_(0.7)TiO_(3)薄膜

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Pb_(0.3)Sr_(0.7)TiO_(3) (PST30) thin films were synthesized on platinized silicon (Pt/Si) and lanthanum aluminate (LAO) substrates using chemical solution deposition technique. The films on LAO substrate were highly (100) oriented, whereas the films on Pt/Si substrate were polycrystalline. The low dielectric loss in the PST30/LAO films makes them attractive for fabricating tunable dielectric devices. An eight-element coupled microstrip phase shifter was fabricated on PST30/LAO film and tested in the frequency range ~15-17 GHz. The maximum figure of merit (K=phase shift per dB loss) of ~56°/dB was obtained for PST30 film, which was better than commonly observed value in pure barium strontium titanate films. This makes PST30 a potential candidate material for further investigations for microwave applications.
机译:使用化学溶液沉积技术在镀铂硅(Pt / Si)和铝酸镧(LAO)衬底上合成了Pb_(0.3)Sr_(0.7)TiO_(3)(PST30)薄膜。 LAO衬底上的薄膜是高度(100)取向的,而Pt / Si衬底上的薄膜是多晶的。 PST30 / LAO膜的低介电损耗使其对于制造可调谐介电器件具有吸引力。在PST30 / LAO薄膜上制造了八元件耦合微带移相器,并在〜15-17 GHz的频率范围内进行了测试。 PST30薄膜的最大品质因数(K =每dB损耗的相移)达到〜56°/ dB,比纯钛酸锶锶薄膜的通常观察值要好。这使PST30成为进一步研究微波应用的潜在候选材料。

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