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Modification of critical current density of MgB_(2) films irradiated with 200 MeV Ag ions

机译:修饰200 MeV Ag离子辐照的MgB_(2)薄膜的临界电流密度

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摘要

The effect of 200 MeV Ag ion irradiation on the temperature and field dependence of critical current density (J_(C)) of high quality MgB_(2) thin films is studied. Substantial increase in J_(C) is observed over a certain field range for the film irradiated at a dose of 10~(12) ions/cm~(2). Our analysis suggests that columnar defects are not formed under irradiation conditions used in these studies, which correspond to an electronic energy loss of about 16 keVm. Defects clusters are likely to be responsible for the observed improvement in J_(C).
机译:研究了200 MeV Ag离子辐照对高质量MgB_(2)薄膜临界电流密度(J_(C))的温度和场依赖性的影响。在以10〜(12)离子/ cm〜(2)的剂量辐照的薄膜上,在一定的电场范围内观察到J_(C)的大幅增加。我们的分析表明,在这些研究中使用的辐照条件下不会形成柱状缺陷,这相当于约16 keV / nm的电子能量损失。缺陷簇可能是导致J_(C)改善的原因。

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