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首页> 外文期刊>Applied Physics Letters >Structural characterization of zincblende Ga_(1-x)Mn_xN epilayers grown by molecular beam epitaxy on (001) GaAs substrates
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Structural characterization of zincblende Ga_(1-x)Mn_xN epilayers grown by molecular beam epitaxy on (001) GaAs substrates

机译:分子束外延在(001)GaAs衬底上生长的闪锌矿Ga_(1-x)Mn_xN外延层的结构表征

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摘要

Zincblende p-type Ga_(1-x)M_xN epilayers, grown with and without AlN/GaN buffer layers using plasma-assisted molecular beam epitaxy on (001) oriented GaAs substrates, have been investigated using a variety of complementary transmission electron microscopy techniques. The epilayers were found to contain a high anisotropic density of stacking faults and microtwins. MnAs inclusions were identified at the Ga_(1-x)Mn_xN/(001)GaAs interface extending into the substrate. The use of AlN/GaN buffer layers was found to inhibit the formation of these inclusions.
机译:使用多种互补的透射电子显微镜技术研究了在(001)取向的GaAs衬底上使用等离子辅助分子束外延生长有无AlN / GaN缓冲层的Zincblende p型Ga_(1-x)M_xN外延层。发现外延层具有高的各向异性密度的堆叠断层和微孪晶。在延伸到衬底中的Ga_(1-x)Mn_xN /(001)GaAs界面处发现了MnAs夹杂物。发现使用AlN / GaN缓冲层抑制了这些夹杂物的形成。

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