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p-ZnO-GaN heterostructure ZnO light-emitting diodes

机译:p-ZnO / n-GaN异质结构ZnO发光二极管

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摘要

We report on the characteristics of a ZnO light-emitting diode (LED) comprised of a heterostructure of p-ZnO-GaN. The LED structure consisted of a phosphorus doped p-ZnO film with a hole concentration of 6.68 X 10~(17) cm~(-3) and a Si-doped n-GaN film with an electron concentration of l.1X10~(18)cm~(-3). The I-V of the LED showed a threshold voltage of 5.4 V and an electroluminescence (EL) emission of 409 nm at room temperature. The EL emission peak at 409 nm was attributed to the band gap of p-ZnO which was reduced as the result of the band offset at the interface of p-ZnO and n-GaN.
机译:我们报告了由p-ZnO / n-GaN异质结构组成的ZnO发光二极管(LED)的特性。 LED结构由空穴浓度为6.68 X 10〜(17)cm〜(-3)的磷掺杂p-ZnO薄膜和电子浓度为1.1X10〜(18)的硅掺杂n-GaN薄膜组成。厘米〜(-3) LED的I-V在室温下显示出5.4 V的阈值电压和409 nm的电致发光(EL)发射。 409 nm处的EL发射峰归因于p-ZnO的带隙,由于p-ZnO和n-GaN界面处的带隙而减小了该带隙。

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