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Investigation on the p-type formation mechanism of arsenic doped p-type ZnO thin film

机译:砷掺杂p型ZnO薄膜的p型形成机理研究

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摘要

The photoluminescence spectra of As doped p-type ZnO thin films reveal neutral acceptor bound exciton of 3.3437 eV and a transition between free electrons and acceptor levels of 3.2924 eV. Calculated acceptor binding energy is about 0.1455 eV. Thermal activation and doping mechanism of this film have been suggested by the analysis of x-ray photoelectron spectroscopy. p-type formation mechanism of As doped ZnO thin film is related to the As_(Zn)-2V_(Zn) complex model. ZnO-based p-n junction was fabricated by the deposition of an undoped n-type ZnO layer on an As doped p-type ZnO layer.
机译:As掺杂的p型ZnO薄膜的光致发光光谱显示,中性受主结合的激子为3.3437 eV,自由电子与受主之间的跃迁为3.2924 eV。计算的受体结合能为约0.1455eV。通过X射线光电子能谱的分析已经提出了该膜的热活化和掺杂机理。 As掺杂ZnO薄膜的p型形成机理与As_(Zn)-2V_(Zn)络合物模型有关。通过在As掺杂的p型ZnO层上沉积未掺杂的n型ZnO层来制造基于ZnO的p-n结。

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