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首页> 外文期刊>Applied Physics Letters >Electrical properties of AlGaN/GaN heterostructures grown on vicinal sapphire (0001) substrates by molecular beam epitaxy
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Electrical properties of AlGaN/GaN heterostructures grown on vicinal sapphire (0001) substrates by molecular beam epitaxy

机译:通过分子束外延在邻近蓝宝石(0001)衬底上生长的AlGaN / GaN异质结构的电性能

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摘要

Electrical properties of AIGaN/GaN heterostructures grown on vicinal sapphire (0001) substrates by molecular beam epitaxy (MBE) are investigated. It is found that electrical properties of the two-dimensional electron gas (2DEG) in the heterostructures grown on 2.0°-off vicinal substrates are superior to those grown on the 0.5°-off vicinal substrates. Anisotropic phenomenon of the 2DEG mobility in the heterostructures grown on 2.0°-off substrates is demonstrated, which strongly relates to the macrostep structures on the surface. The 2DEG mobility as high as 2018 cm~2/V s is obtained at the room temperature from the authors' all-MBE-grown sample measured in the direction parallel to the macrostep. It is suggested that the direction effect should be taken into account when designing the device structure.
机译:研究了通过分子束外延(MBE)在邻近蓝宝石(0001)衬底上生长的AIGaN / GaN异质结构的电性能。已经发现,在偏离2.0°的邻近衬底上生长的异质结构中的二维电子气(2DEG)的电学性能优于偏离0.5°的邻近衬底上生长的异质结构。证明了在2.0°-off衬底上生长的异质结构中2DEG迁移率的各向异性现象,这与表面的宏观台阶结构密切相关。在室温下,从作者在平行于宏台阶的方向上测量的所有MBE生长的样品中获得的2DEG迁移率高达2018 cm〜2 / V s。建议在设计器件结构时应考虑方向效应。

著录项

  • 来源
    《Applied Physics Letters 》 |2006年第17期| p.171906.1-171906.3| 共3页
  • 作者单位

    Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Umezono 1-1-1, Central 2, Tsukuba-shi, Ibaraki 305-8568, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学 ; 计量学 ;
  • 关键词

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