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Stacking faults in YBa_2Cu_3O_(7-x): Measurement using x-ray diffraction and effects on critical current

机译:YBa_2Cu_3O_(7-x)中的堆叠故障:使用X射线衍射进行测量及其对临界电流的影响

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摘要

The density n of stacking faults (SFs) in epitaxial YBa_2Cu_3O_(7-x) (Y123) films, consisting of extra CuO planes, is measured by fitting x-ray diffraction patterns using a random stacking model. The SF density is n=0.068 nm~(-1) in films grown by metal-organic deposition on textured templates and optimized for high I_c. The presence of SF is correlated with pinning of magnetic field (H) applied in the Y123 ab plane. SF can be nearly eliminated by a high temperature anneal, or by adding excess Dy, resulting in I_c which is nearly independent of the orientation of H.
机译:通过使用随机堆叠模型拟合X射线衍射图来测量外延YBa_2Cu_3O_(7-x)(Y123)薄膜中由额外CuO平面组成的堆叠缺陷(SFs)的密度n。通过金属有机沉积在纹理模板上生长并针对高I_c进行优化的薄膜中,SF密度为n = 0.068 nm〜(-1)。 SF的存在与Y123 ab平面中施加的磁场(H)的固定相关。 SF可以通过高温退火或通过添加过量的Dy几乎消除,从而导致I_c几乎与H的方向无关。

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