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Two-dimensional electron gas in Zn polar ZnMgO/ZnO heterostructures grown by radical source molecular beam epitaxy

机译:自由基源分子束外延生长的Zn极性ZnMgO / ZnO异质结构中的二维电子气

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摘要

A two-dimensional electron gas was observed in Zn polar ZnMgO/ZnO (ZnMgO on ZnO) heterostructures grown by radical source molecular beam epitaxy. The electron mobility of the ZnMgO/ZnO heterostructures dramatically increased with increasing Mg composition and the electron mobility (μ ~ 250 cm~2/V s) at RT reached a value more than twice that of an undoped ZnO layer (μ ~100 cm~2/V s). The carrier concentration in turn reached values as high as ~1 X 10~(13) cm~(-2) and remained nearly constant regardless of Mg composition. Strong confinement of electrons at the ZnMgO/ZnO interface was confirmed by C-V measurements with a concentration of over 4 X 10~(19) cm~(-3). Temperature-dependent Hall measurements of ZnMgO/ZnO heterostructures also exhibited properties associated with well defined heterostructures. The Hall mobility increased monotonically with decreasing temperature, reaching a value of 2750 cm~2/V s at 4 K. Zn polar "ZnMgO on ZnO" structures are easy to adapt to a top-gate device. These results open new possibilities for high electron mobility transistors based upon ZnO-based materials.
机译:在通过自由基源分子束外延生长的Zn极性ZnMgO / ZnO(ZnO中的ZnMgO)异质结构中观察到二维电子气。 ZnMgO / ZnO异质结构的电子迁移率随Mg组成的增加而显着增加,RT下的电子迁移率(μ〜250 cm〜2 / V s)达到未掺杂ZnO层(μ〜100 cm〜)的两倍以上。 2 / V s)。载流子浓度又达到高达〜1 X 10〜(13)cm〜(-2)的值,并且无论镁的组成如何都几乎保持恒定。 ZnMgO / ZnO界面上电子的强约束作用是通过C-V测量得到的,浓度超过4 X 10〜(19)cm〜(-3)。 ZnMgO / ZnO异质结构的随温度变化的霍尔测量结果也显示出与明确定义的异质结构相关的特性。霍尔迁移率随温度降低而单调增加,在4 K下达到2750 cm〜2 / V s的值。Zn极性“ ZnO上的ZnMgO”结构易于适应顶栅器件。这些结果为基于ZnO的材料的高电子迁移率晶体管开辟了新的可能性。

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