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Colossal electroresistance effect at metal elect rode/La_(1-x)Sr_(1+x)MnO_4 interfaces

机译:金属电极/ La_(1-x)Sr_(1 + x)MnO_4界面上的巨大电阻效应

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摘要

We have studied the current-voltage (Ⅰ-Ⅴ) characteristics and resistance switching at the interface between metal electrodes M (=Pt, Au, Ag, Al, Ti, and Mg) and atomically flat cleaved (001) surfaces of La_(1-x)Sr_(1+x)MnO_4 (x=0-1.0) single crystals by using a three-probe method. Hysteretic Ⅰ-Ⅴ characteristics, indicating the appearance of the resistance switching, were observed in the junctions for M=Mg, Al, and Ti, which have relatively shallow work functions. The resistance switching ratio depends on the hole doping x and the optimal doping level is around x=0.5, verifying that the resistance switching property can be controlled by the doping level.
机译:我们研究了金属电极M(= Pt,Au,Ag,Al,Ti和Mg)与La_(1)的原子平坦分裂(001)表面之间的电流-电压(Ⅰ-Ⅴ)特性和电阻转换使用三探针法制备-x)Sr_(1 + x)MnO_4(x = 0-1.0)单晶。在具有较浅功函数的M = Mg,Al和Ti的结中观察到指示电阻切换出现的滞后性Ⅰ-Ⅴ特性。电阻切换比取决于空穴掺杂x,并且最佳掺杂水平在x = 0.5左右,这证明了可以通过掺杂水平控制电阻切换特性。

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