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首页> 外文期刊>Applied Physics Letters >Deep ultraviolet photoluminescence studies of AlN photonic crystals
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Deep ultraviolet photoluminescence studies of AlN photonic crystals

机译:AlN光子晶体的深紫外光致发光研究

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摘要

Two-dimensional AlN photonic crystals (PCs) with varying periodicity/diameter down to 150/75 nm were fabricated. Deep ultraviolet photoluminescence spectroscopy has been employed to study the optical properties of AlN PCs. With PC formation, a 20-fold enhancement in the band edge emission intensity at 208 nm over unpatterned AlN epilayer has been observed. The emission intensity increases with decreasing lattice constant of AlN PCs. However, the spectral peak energy decreases with decreasing lattice constant, indicating a possible release of compressive stresses as a result of PC formation. Successful fabrication of AlN PCs opens up new opportunities for exploring novel physical phenomena in the artificially structured photonic band gap material system and their applications, particularly in the area of deep UV photonics.
机译:制作了二维AlN光子晶体(PC),其周期性/直径低至150/75 nm。深紫外光致发光光谱已被用于研究AlN PC的光学性质。随着PC的形成,已观察到在208 nm处,带状边沿发射强度比未构图的AlN外延层提高了20倍。发射强度随AlN PC晶格常数的减小而增加。但是,谱峰能量随晶格常数的减小而减小,表明由于PC的形成,可能释放了压缩应力。 AlN PC的成功制造为探索人工结构的光子带隙材料系统及其应用中的新型物理现象提供了新的机会,特别是在深紫外光子学领域。

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