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Mean barrier height of Pd Schottky contacts on ZnO thin films

机译:ZnO薄膜上Pd肖特基接触的平均势垒高度

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We have investigated the temperature dependence of the barrier height of high-quality Pd Schottky contacts on (0001)-oriented ZnO thin films by temperature-dependent current-voltage and capacitance-voltage (CV) measurements. The films have been grown by pulsed-laser deposition. The effective Schottky barrier height Φ_(B, eff) deduced from the current-voltage measurements was evaluated by considering a Gaussian barrier height distribution with a standard deviation σ around a mean barrier height Φ_(B, m). We determined Φ_(B, m) = (1.16 ± 0.04) eV which agrees well with the value of 1.14 eV determined by CV measurements. The standard deviation is determined to be (134 ± 10) meV.
机译:我们已经通过与温度相关的电流-电压和电容-电压(CV)测量来研究高质量的Pd肖特基触头在(0001)取向的ZnO薄膜上势垒高度的温度依赖性。薄膜已经通过脉冲激光沉积法生长。通过考虑在平均势垒高度Φ_(B,m)附近具有标准偏差σ的高斯势垒高度分布,来评估从电流电压测量得出的有效肖特基势垒高度Φ_(B,eff)。我们确定Φ_(B,m)=(1.16±0.04)eV,这与CV测量确定的1.14 eV值非常吻合。确定标准偏差为(134±10)meV。

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