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Trapping artifacts in quasi-steady-state photoluminescence and photoconductance lifetime measurements on silicon wafers

机译:硅晶片上准稳态光致发光和光导寿命测量中的俘获伪像

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摘要

Photoluminescence and photoconductance lifetime measurements on multicrystalline silicon wafers are presented. It is demonstrated experimentally that the large overestimation of the lifetime at low carrier concentrations due to trapping that is observed in photoconductance measurements is not found in photoluminescence data. This is explained theoretically by the dependence of photoluminescence and photoconductance on the product and the sum, respectively, of the minority and majority carrier densities. Based on this analysis, it is shown that photoluminescence lifetime measurements are not significantly affected by minority carrier trapping in most practical cases while implied current-voltage curves obtained from photoluminescence are completely unaffected.
机译:提出了在多晶硅晶片上的光致发光和光导寿命的测量。实验证明,在光致发光数据中未发现由于在光导测量中观察到的俘获而导致的在低载流子浓度下寿命的高估。从理论上讲,这是通过光致发光和光电导分别依赖于少数载流子密度和多数载流子密度的乘积和总和来决定的。基于该分析,表明在大多数实际情况下,少数载流子捕获不会显着影响光致发光寿命的测量,而从光致发光获得的隐含电流-电压曲线则完全不受影响。

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