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首页> 外文期刊>Applied Physics Letters >Interface structure and strain relaxation in BaTiO_3 thin films grown on GdScO_3 and DyScO_3 substrates with buried coherent SrRuO_3 layer
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Interface structure and strain relaxation in BaTiO_3 thin films grown on GdScO_3 and DyScO_3 substrates with buried coherent SrRuO_3 layer

机译:在具有掩埋相干SrRuO_3层的GdScO_3和DyScO_3衬底上生长的BaTiO_3薄膜的界面结构和应变松弛

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摘要

To obtain the electrical properties of strained ferroelectric thin films, bottom electrodes with lattice constants and thermal coefficients matched to both films and substrates are needed. The interface structure, strain configuration, and strain relaxation in such bilayer systems are different from those in single layer systems. Here, we report transmission electron microscopy studies of epitaxial BaTiO_3 films grown on GdScO_3 and DyScO_3 substrates with buried SrRuO_3 layers. We found that the different strain relaxation behaviors observed in the bilayer are mainly dependent on lattice mismatch of each layer to the substrate and the thicknesses of each layer.
机译:为了获得应变铁电薄膜的电性能,需要具有晶格常数和热系数与薄膜和基板均匹配的底部电极。这种双层系统中的界面结构,应变构型和应变松弛不同于单层系统。在这里,我们报道了在具有掩埋SrRuO_3层的GdScO_3和DyScO_3衬底上生长的外延BaTiO_3膜的透射电子显微镜研究。我们发现在双层中观察到的不同的应变松弛行为主要取决于每一层与衬底的晶格失配以及每一层的厚度。

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