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首页> 外文期刊>Applied Physics Letters >Epitaxial growth of M-type Ba-hexaferrite films on MgO (111)‖SiC (0001) with low ferromagnetic resonance linewidths
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Epitaxial growth of M-type Ba-hexaferrite films on MgO (111)‖SiC (0001) with low ferromagnetic resonance linewidths

机译:低铁磁共振线宽的MgO(111)‖SiC(0001)上外延生长M型八方铁氧体薄膜

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摘要

Barium hexaferrite (BaM) films were deposited on 10 nm MgO (111) films on 6H silicon carbide (0001) substrates by pulsed laser deposition from a homogeneous BaFe_(12)O_(19) target. The MgO layer, deposited by molecular beam epitaxy, alleviated lattice mismatch and interdiffusion between film and substrate. X-ray diffraction showed strong crystallographic alignment while pole figures exhibited reflections consistent with epitaxial growth. After optimized annealing, these BaM films have a perpendicular magnetic anisotropy field of 16 900 Oe, a magnetization (as 4πM_s) of 4.4 kG, and a ferromagnetic resonance peak-to-peak derivative linewidth at 53 GHz of 96 Oe, thus demonstrating sufficient properties for microwave device applications.
机译:通过从均匀BaFe_(12)O_(19)靶进行脉冲激光沉积,在6H碳化硅(0001)基板上的10 nm MgO(111)膜上沉积六铁酸钡(BaM)膜。通过分子束外延沉积的MgO层可减轻晶格失配和薄膜与基材之间的相互扩散。 X射线衍射显示出强的晶体学排列,而极图显示出与外延生长一致的反射。经过优化退火后,这些BaM膜的垂直磁各向异性场为16900 Oe,磁化强度(为4πM_s)为4.4 kG,在53 GHz处的铁磁共振峰峰导数线宽为96 Oe,从而证明了足够的性能适用于微波设备应用。

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