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Carrier transport mechanisms of the writing and the erasing processes for Al/ZnO nanoparticles embedded in a polyimide layer/p-Si diodes

机译:嵌入聚酰亚胺层/ p-Si二极管中的Al / ZnO纳米粒子的写入和擦除过程的载流子传输机制

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摘要

Capacitance-voltage measurements on Al/ZnO nanocrystals embedded in polyimide (PI) layer/p-Si diodes at 300 K showed a metal-insulator-semiconductor behavior with a flatband voltage shift. Current-voltage (I-V) measurements on the diodes showed that carrier transport processes were attributed to the Poole-Frenkel effect and to thermionic emission. Possible carrier transport mechanisms of the writing and the erasing processes for the Al/ZnO nanocrystals embedded in PI layer/p-Si diodes are described on the basis of the I-V results.
机译:埋入聚酰亚胺(PI)层/ p-Si二极管中的Al / ZnO纳米晶体在300 K时的电容电压测量结果显示,金属-绝缘体-半导体行为具有平带电压漂移。二极管上的电流-电压(I-V)测量表明,载流子传输过程归因于Poole-Frenkel效应和热电子发射。基于IV结果,描述了嵌入在PI层/ p-Si二极管中的Al / ZnO纳米晶体的写入和擦除过程的可能的载流子传输机制。

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