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Defects in hydrothermally grown bulk ZnO

机译:水热生长的块状ZnO中的缺陷

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Hydrothermally grown bulk ZnO (Tokyo Denpa) was investigated using junction-capacitance spectroscopy on silver oxide Schottky contacts (barrier height of 1.20 eV, ideality factor of 1.04). Two main shallow defects, T1 and T2, with thermal activation energies of 13 and 52 meV, respectively, were identified. Two closely lying, deep defect levels E3/E3' at approximately 320 meV below the conduction band were found in higher concentrations (mid-10~(14) cm~(-3)) than the shallow donors. 4 K photoluminescence showed dominant emission from excitons bound to three neutral donors, aluminum, hydrogen, and an unassigned impurity, with donor binding energies close to the thermal activation energy of T2.
机译:使用结电容光谱在氧化银肖特基接触(势垒高度为1.20 eV,理想因子为1.04)上研究了水热生长的块状ZnO(东京Denpa)。确定了两个主要的浅缺陷T1和T2,分别具有13和52 meV的热活化能。在导带下方约320 meV处发现了两个密闭的深缺陷水平E3 / E3',其浓度比浅施主的浓度高(10〜(14)cm〜(-3)中)。 4 K光致发光显示出与三个中性施主,铝,氢和未分配的杂质结合的激子的主要发射,施主结合能接近T2的热活化能。

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