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首页> 外文期刊>Applied Physics Letters >Positronium annihilation and pore surface chemistry in mesoporous silica films
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Positronium annihilation and pore surface chemistry in mesoporous silica films

机译:介孔二氧化硅薄膜中的正电子an灭和孔表面化学

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摘要

Lifetimes of ortho-positronium in mesoporous silica films were measured before and after surface trimethylsilylation of -OH groups. Variations of positronium lifetimes in the mesopores upon the surface modification indicate that the interaction between positronium and the pore surface is weakened in the pores, whose surface is covered with -CH_3 groups, in comparison with those covered with -OH groups. This is consistent with the authors' previous observation that positronium slowing down is less efficient in the pores covered with -CH_3 groups. The present work demonstrates that in the porosimetric application of positron annihilation lifetime spectroscopy, the interaction between positronium and the pore surface has to be properly taken into consideration.
机译:在-OH基团的表面三甲基甲硅烷基化之前和之后,测量了介孔二氧化硅膜中邻位正电子的寿命。表面修饰后中孔中正电子寿命的变化表明,与被-OH基团覆盖的孔相比,在正表面上被-CH_3基团覆盖的孔中,正电子与孔表面之间的相互作用减弱。这与作者先前的观察结果一致,即在被-CH_3基团覆盖的孔中,正电子的减速效率较低。本工作表明,在正电子an没寿命谱仪的孔隙率法应用中,必须适当考虑正电子与孔表面之间的相互作用。

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