首页> 外文期刊>Applied Physics Letters >Origin of colossal dielectric response of CaCu_3Ti_4O_(12) studied by using CaTiO_3/CaCu_3Ti_4O_(12)/CaTiO_3 multilayer thin films
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Origin of colossal dielectric response of CaCu_3Ti_4O_(12) studied by using CaTiO_3/CaCu_3Ti_4O_(12)/CaTiO_3 multilayer thin films

机译:CaTiO_3 / CaCu_3Ti_4O_(12)/ CaTiO_3多层薄膜研究CaCu_3Ti_4O_(12)的巨大介电响应的起源

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摘要

To elucidate the origin of the colossal dielectric response (CDR) of CaCu_3Ti_4O_(12) (CCTO), multilayer thin films of CCTO interposed in insulating CaTiO_3 (CTO) were synthesized using a pulsed laser deposition technique. The capacitance C of CTO/CCTO/CTO films with different layer thicknesses is measured. After removing the capacitance of CTO by extrapolating C to zero CTO thickness, the real part of dielectric constant of CCTO is estimated to be 329-435, which is much smaller than the reported value for CCTO thin films. This fact indicates that the CDR of CCTO is extrinsic and originates from an internal barrier layer capacitor.
机译:为了阐明CaCu_3Ti_4O_(12)(CCTO)的巨大介电响应(CDR)的起源,使用脉冲激光沉积技术合成了插入绝缘CaTiO_3(CTO)中的CCTO多层薄膜。测量具有不同层厚度的CTO / CCTO / CTO膜的电容C。通过将C外推到零的CTO厚度来去除CTO的电容后,CCTO介电常数的实部估计为329-435,这比CCTO薄膜的报告值小得多。此事实表明CCTO的CDR是外部的,并且源自内部势垒层电容器。

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