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High-temperature ferromagnetism in amorphous semiconductor Ge_3Mn thin films

机译:非晶半导体Ge_3Mn薄膜中的高温铁磁性

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The Ge_(1-x)Mn_x thin films were fabricated at x=0.25, of which the composition is close to Ge_3Mn. They showed ferromagnetism up to above 350 K, even though their structure is amorphous. Ge_3Mn amorphous samples grown at 200℃ have n-type characteristics, while those grown at 500℃ have p-type characteristics. The former has a different state from the latter, energetically. It is suggested that the different short range orders of Ge_3Mn_5 and/or Ge_8Mn_(11) have already formed in the amorphous phase according to the growth temperature. The authors have also discussed the relationship between ferromagnetism and cluster formations after annealing at 800℃.
机译:以x = 0.25制造Ge_(1-x)Mn_x薄膜,其组成接近Ge_3Mn。它们显示出高达350 K以上的铁磁性,即使它们的结构是非晶态的。在200℃下生长的Ge_3Mn非晶样品具有n型特征,而在500℃下生长的样品具有p型特征。前者在能量上与后者具有不同的状态。建议根据生长温度在非晶相中已经形成了不同的短程Ge_3Mn_5和/或Ge_8Mn_(11)。作者还讨论了在800℃退火后铁磁性与团簇形成之间的关系。

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