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首页> 外文期刊>Applied Physics Letters >Soft nitridation of GaAs(100) by hydrazine sulfide solutions: Effect on surface recombination and surface barrier
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Soft nitridation of GaAs(100) by hydrazine sulfide solutions: Effect on surface recombination and surface barrier

机译:硫化肼溶液对GaAs(100)的软氮化:对表面重组和表面势垒的影响

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The effect of nitridation of GaAs(100) by hydrazine sulfide solutions on the surface recombination velocity and surface barrier has been studied using photoluminescence and photoreflectance spectroscopies. Nitridation produces a decrease of surface recombination velocity by a factor of 26. After three years of air exposure, the recombination velocity is still smaller than for the naturally oxidized surface by a factor of 11. The observed effect is caused by a continuous nitride monolayer bonded with the GaAs substrate. The surface Fermi level is still pinned near midgap, which is attributed to residual unpassivated surface defects.
机译:使用光致发光和光反射光谱研究了硫化肼溶液对GaAs(100)的氮化对表面复合速度和表面势垒的影响。渗氮会使表面复合速度降低26倍。暴露于空气中三年后,复合速度仍比自然氧化表面低11倍。观察到的效果是由连续的氮化物单层键合造成的砷化镓衬底。表面费米能级仍固定在中间间隙附近,这归因于残留的未钝化表面缺陷。

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