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首页> 外文期刊>Applied Physicsletters >Observation Of Collisionless Heating Of Low Energy Electrons In Low Pressure Inductively Coupled Argon Plasmas
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Observation Of Collisionless Heating Of Low Energy Electrons In Low Pressure Inductively Coupled Argon Plasmas

机译:低压电感耦合氩等离子体中低能电子的无碰撞加热观察

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摘要

Collisionless heating of low energy electrons was observed in low pressure argon rf-biased inductively coupled plasmas (ICPs) by measurement of the electron energy distribution function (EEDF). When only capacitive power (bias) was supplied, the EEDF in the discharge was a bi-Maxwellian distribution with two electron groups. It was found that the low energy electrons were heated up significantly even with a little inductive power (<20 W) even when the discharge was in E mode. Due to the low gas pressure and low temperature of low energy electrons (close to the energy of the Ramsauer minimum), the collisional heating of low energy electrons appears to be negligible. Therefore, this effective heating of the low energy electrons showed a direct experimental evidence of the collisionless heating by inductive field. The significant heating of low energy electrons in E mode indicates that collisionless heating in the skin layer is an important electron heating mechanism of low pressure ICP even when the discharge is in E mode.
机译:通过测量电子能量分布函数(EEDF),在低压氩rf偏压的电感耦合等离子体(ICPs)中观察到了低能电子的无碰撞加热。当仅提供电容性功率(偏置)时,放电中的EEDF是具有两个电子基团的双麦克斯韦分布。发现即使当放电处于E模式时,低能量电子也以很小的感应功率(<20W)被显着加热。由于低气压和低能量电子的低温(接近Ramsauer最小值的能量),低能量电子的碰撞加热似乎可以忽略不计。因此,低能电子的这种有效加热显示了感应场无碰撞加热的直接实验证据。 E模式下低能电子的大量加热表明,即使在E模式下放电,表皮层中的无碰撞加热也是低压ICP的重要电子加热机制。

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