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Absolute density and temperature of O(~1D_2) in highly Ar or Kr diluted O_2 plasma

机译:高度Ar或Kr稀释的O_2等离子体中O(〜1D_2)的绝对密度和温度

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The absolute density and translational temperature of excited O atoms [O(~1D_2)] in O_2 surface-wave-excited plasmas (SWPs) with high Kr or Ar dilution were measured by using vacuum ultraviolet laser absorption spectroscopy. It was observed that the absolute density of O(~1D_2) in Kr/O_2 SWP was lower than that in Ar/O_2 SWP above a pressure of 90 Pa, and the O(~1D_2) had an elevated temperature of around 2000 K in the SWPs. Furthermore, the O(~1D_2) flux was identified as a key parameter in the oxidation process. These results are very important knowledge relevant to plasma oxidation.
机译:使用真空紫外激光吸收光谱法测量了高Kr或Ar稀释的O_2表面波激发等离子体(SWPs)中被激发的O原子[O(〜1D_2)]的绝对密度和平移温度。观察到,在90 Pa的压力下,Kr / O_2 SWP中O(〜1D_2)的绝对密度低于Ar / O_2 SWP中的绝对密度,并且O(〜1D_2)的高温在2000 K左右。 SWP。此外,O(〜1D_2)通量被确定为氧化过程中的关键参数。这些结果是与等离子体氧化有关的非常重要的知识。

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