机译:热处理对分子束外延生长ZnO薄膜电性能的影响
Center for Interdisciplinary Research, Tohoku University, Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, Japan;
Center for Interdisciplinary Research, Tohoku University, Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, Japan;
Center for Interdisciplinary Research, Tohoku University, Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, Japan;
Center for Interdisciplinary Research, Tohoku University, Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, Japan;
Center for Interdisciplinary Research, Tohoku University, Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, Japan;
Center for Interdisciplinary Research, Tohoku University, Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, Japan;
Center for Interdisciplinary Research, Tohoku University, Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, Japan;
NeosemiTech Corporation, 7-14 Songdo-dong, Yeonsu-gu, Incheon 406-840, Republic of Korea;
Department of Mechatronics Engineering, Hoseo University, 165 Sechul-ri, Baebang-myun, Asan 336-795, Republic of Korea;
Department of Defense Science and Technology, Hoseo University, 165 Sechul-ri, Baebang-myun, Asan 336-795, Republic of Korea;
Department of Defense Science and Technology, Hoseo University, 165 Sechul-ri, Baebang-myun, Asan 336-795, Republic of Korea;
机译:Te电子掺杂对分子束外延生长ZnO薄膜物理性能的影响
机译:等离子辅助分子束外延生长非极性ZnO薄膜的结构和光学性质
机译:等离子体辅助分子束外延在R面蓝宝石衬底上生长的非极性A面ZnO膜的结构和光学性质
机译:在GaN(OOOl)模板上通过等离子体辅助分子束外延生长的In掺杂ZnO薄膜的电学性质
机译:通过分子束外延生长的碳掺杂氮化镓的电学,光学和缺陷性质。
机译:快速热退火对原子层沉积生长Zr掺杂ZnO薄膜的结构电学和光学性质的影响
机译:双缓冲层对射频等离子体辅助分子束外延生长Ga极性GaN薄膜性能的影响