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Magnetization relaxation and structure of CoFeGe alloys

机译:CoFeGe合金的磁化弛豫和结构

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摘要

The magnetic relaxation of 10 and 50 nm thin films of (CoFe)_(100-x)Ge_x (0 at. %≤35 at. %) alloys was investigated by broadband ferromagnetic resonance (FMR) experiments. 10 nm thin films exhibit a significant two magnon contribution to the FMR linewidth. The 50 nm films exhibit very low damping constants of α ≈0.0025 and relaxation rates as low as 33 MHz in the composition range of 20 at. %≤x≤30 at. % Ge after annealing. Structural characterization revealed B2 order for these compositions. First principles calculations confirm a pseudogap in the minority channel for 62 ordered (CoFe)_(75)Ge_(25) which may cause the low damping parameters and high ΔRA in CoFeGe based current perpendicular to the plane giant magnetoresistance spin valves.
机译:通过宽带铁磁共振(FMR)实验研究了(CoFe)_(100-x)Ge_x(0 at。%≤35at。%)合金的10和50 nm薄膜的磁弛豫。 10 nm薄膜对FMR线宽表现出明显的两个磁振子贡献。 50 nm薄膜在20 at的成分范围内表现出非常低的阻尼常数α≈0.0025,弛豫率低至33 MHz。 %≤x≤30at。退火后的%Ge。结构表征揭示了这些组合物的B2顺序。第一性原理计算确认了在62个有序(CoFe)_(75)Ge_(25)的少数通道中存在伪间隙,这可能会导致垂直于平面巨磁阻自旋阀的CoFeGe基电流中的低阻尼参数和高ΔRA。

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  • 来源
    《Applied Physicsletters》 |2009年第8期|082502.1-082502.3|共3页
  • 作者单位

    Department of Physics and Astronomy, MINT Center, University of Alabama, Tuscaloosa, Alabama 35487, USA;

    Department of Physics and Astronomy, MINT Center, University of Alabama, Tuscaloosa, Alabama 35487, USA;

    Department of Physics and Astronomy, MINT Center, University of Alabama, Tuscaloosa, Alabama 35487, USA;

    Department of Physics and Astronomy, MINT Center, University of Alabama, Tuscaloosa, Alabama 35487, USA;

    Department of Physics and Astronomy, MINT Center, University of Alabama, Tuscaloosa, Alabama 35487, USA;

    San Jose Research Center, Hitachi Global Storage Technologies, 3403 Yerba Buena Road, San Jose, California 95135, USA;

    San Jose Research Center, Hitachi Global Storage Technologies, 3403 Yerba Buena Road, San Jose, California 95135, USA;

    San Jose Research Center, Hitachi Global Storage Technologies, 3403 Yerba Buena Road, San Jose, California 95135, USA;

    San Jose Research Center, Hitachi Global Storage Technologies, 3403 Yerba Buena Road, San Jose, California 95135, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:19:50

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