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Carrier recombination mechanisms and efficiency droop in GalnN/GaN light-emitting diodes

机译:GalnN / GaN发光二极管中的载流子复合机理和效率下降

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摘要

We model the carrier recombination mechanisms in GalnN/GaN light-emitting diodes as R=An +Bn~2+Cn~3+f(n), where f(n) represents carrier leakage out of the active region. The term f(n) is expanded into a power series and shown to have higher-than-third-order contributions to the recombination. The total third-order nonradiative coefficient (which may include an f(n) leakage contribution and an Auger contribution) is found to be 8×10~(-29) cm~6 s~(-1). Comparison of the theoretical ABC+f(n) model with experimental data shows that a good fit requires the inclusion of the f(n) term.
机译:我们将GalnN / GaN发光二极管中的载流子复合机理建模为R = An + Bn〜2 + Cn〜3 + f(n),其中f(n)代表载流子从有源区泄漏出来。 f(n)项被扩展为幂级数,并显示出对重组具有高于三阶的贡献。发现总的三阶非辐射系数(可能包括f(n)泄漏贡献和Auger贡献)为8×10〜(-29)cm〜6 s〜(-1)。理论ABC + f(n)模型与实验数据的比较表明,良好的拟合度需要包含f(n)项。

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  • 来源
    《Applied Physics Letters》 |2010年第13期|p.133507.1-133507.3|共3页
  • 作者单位

    Department of Physics, Applied Physics and Astronomy and Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Department of Physics, Applied Physics and Astronomy and Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Department of Physics, Applied Physics and Astronomy and Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Department of Physics, Applied Physics and Astronomy and Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Department of Physics, Applied Physics and Astronomy and Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Department of Physics, Applied Physics and Astronomy and Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Sandia National Laboratories, Albuquerque, New Mexico 87185, USA;

    Sandia National Laboratories, Albuquerque, New Mexico 87185, USA;

    R&D Institute, Samsung LED, Suwon 443-743, Republic of Korea;

    rnR&D Institute, Samsung LED, Suwon 443-743, Republic of Korea;

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  • 正文语种 eng
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