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Efficient light management scheme for thin film silicon solar cells via transparent random nanostructures fabricated by nanoimprinting

机译:通过纳米压印制造的透明随机纳米结构,用于薄膜硅太阳能电池的高效光管理方案

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摘要

We propose the use of transparent replicated random nanostructures fabricated via nanoimprinting on glass as next-generation superstates for thin film silicon solar cells. We validate our approach by demonstrating short-circuit current densities for p-i-n hydrogenated microcrystalline silicon solar cells as high as for state-of-the-art nanotextured ZnO front electrodes. Our methodology opens exciting possibilities to integrate a large variety of nanostructures into p-i-n solar cells and allows to systematically investigate the influence of interface morphology on the optical and electronic properties of the device in order to further improve device performance.
机译:我们建议使用通过在玻璃上进行纳米压印制造的透明复制随机纳米结构,作为薄膜硅太阳能电池的下一代超状态。我们通过证明p-i-n氢化微晶硅太阳能电池的短路电流密度与先进的纳米织构ZnO前电极一样高,来验证我们的方法。我们的方法学为将各种纳米结构整合到p-i-n太阳能电池中提供了令人兴奋的可能性,并允许系统地研究界面形态对器件光学和电子性能的影响,以进一步提高器件性能。

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  • 来源
    《Applied Physicsletters》 |2010年第21期|P.213504.1-213504.3|共3页
  • 作者单位

    Institute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

    rnInstitute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

    rnInstitute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

    rnInstitute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

    rnInstitute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

    rnInstitute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

    rnInstitute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

    rnInstitute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

    rnInstitute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

    rnInstitute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

    rnInstitute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

    rnInstitute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Ecole Polytechnique Federate de Lausanne (EPFL), 2000 Neuchatel, Switzerland;

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  • 正文语种 eng
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