机译:费米能级钉扎/钉扎对Ge / CoFeB和Ge / MgO / CoFeB结构中肖特基势垒高度和接触电阻的影响
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA;
Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA;
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA;
Components Research, Intel Corporation, 2200 Mission College Blvd., Santa Clara, California 95052,USA;
Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA;
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA;
机译:费米能级钉扎/钉扎对Ge / CoFeB和Ge / MgO / CoFeB结构中肖特基势垒高度和接触电阻的影响
机译:通过使用金属/氧化镍/硅触点的费米能级钉扎降低空穴的肖特基势垒高度
机译:通过使用金属/氧化镍/硅触点的费米能级钉扎降低空穴的肖特基势垒高度
机译:使用单晶MgO的Ge肖特基接触的费米能级脱钉
机译:介电偶极子减轻了肖特基势垒高度调整,从而降低了接触电阻。
机译:Ta / CoFeB / MgO异质结构中Ta / CoFeB界面混合对自旋霍尔角的影响
机译:Ta / CoFeB / MgO异质结构中Ta / CoFeB界面混合对自旋霍尔角的影响