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The influence of Fermi level pinning/depinning on the Schottky barrier height and contact resistance in Ge/CoFeB and Ge/MgO/CoFeB structures

机译:费米能级钉扎/钉扎对Ge / CoFeB和Ge / MgO / CoFeB结构中肖特基势垒高度和接触电阻的影响

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摘要

We demonstrated that an ultrathin MgO layer between CoFeB and Ge modulated the Schottky barrier heights and contact resistances of spin diodes. We confirmed that, surprisingly, an insulating MgO layer significantly decreased the Schottky barrier heights and contact resistances of spin diodes on N+Ge, opposite to the increase observed for P+Ge. A 0.5 nm thick MgO layer on N +Ge decreases the Schottky barrier height from 0.47 to 0.05 eV and lowers the minimum contact resistance 100-fold to 1.5×10~(-6) Ωm~2. These results open a pathway for high efficient spin injection from ferromagnetic materials and semiconductors.
机译:我们证明了CoFeB和Ge之间的超薄MgO层可调节肖特基势垒高度和自旋二极管的接触电阻。我们证实,令人惊讶的是,绝缘的MgO层显着降低了N + Ge上的自旋二极管的肖特基势垒高度和接触电阻,与P + Ge的增加相反。 N + Ge上的0.5 nm厚MgO层将肖特基势垒高度从0.47降低到0.05 eV,并将最小接触电阻降低100倍至1.5×10〜(-6)Ωm〜2。这些结果为铁磁材料和半导体的高效自旋注入开辟了道路。

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  • 来源
    《Applied Physicsletters》 |2010年第5期|052514.1-052514.3|共3页
  • 作者单位

    Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA;

    Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA;

    Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA;

    Components Research, Intel Corporation, 2200 Mission College Blvd., Santa Clara, California 95052,USA;

    Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA;

    Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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