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Phase-field simulation of domain structures in epitaxial BiFeO_3 films on vicinal substrates

机译:相邻衬底上外延BiFeO_3薄膜中畴结构的相场模拟

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摘要

The ferroelectric domain structures of epitaxial BiFeO_3 thin films on miscut substrates were studied using a phase-field model. The effects of substrate vicinality towards (100) are considered by assuming charge-compensated surface and film/substrate interface. The predicted domain structures show remarkable agreement with existing experimental observations, including domain wall orientations and local topological domain configurations. The roles of elastic, electric, and gradient energies on the domain structures were analyzed. It is shown that the substrate strain anisotropy due to the miscut largely determines the domain variant selection and domain configurations
机译:利用相场模型研究了错切衬底上外延BiFeO_3薄膜的铁电畴结构。通过假设电荷补偿的表面和薄膜/基材界面,考虑了基材附近对(100)的影响。预测的域结构显示出与现有实验观察结果的显着一致性,包括域壁取向和局部拓扑域配置。分析了弹性,电能和梯度能在畴结构上的作用。结果表明,由于剪切不当导致的衬底应变各向异性在很大程度上决定了畴变体的选择和畴构型

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  • 来源
    《Applied Physics Letters》 |2011年第5期|p.052903.1-052903.3|共3页
  • 作者

    B. Winchester; P. Wu; L. Q. Chen;

  • 作者单位

    Department of Materials Science and Engineering, Pennsylvania State University, University Park,Pennsylvania 16802, USA;

    Department of Materials Science and Engineering, Pennsylvania State University, University Park,Pennsylvania 16802, USA;

    Department of Materials Science and Engineering, Pennsylvania State University, University Park,Pennsylvania 16802, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 03:18:05

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