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Three-dimensional quantitative chemical roughness of buried ZrO_2/ln_2O_3 interfaces via energy-filtered electron tomography

机译:能量过滤电子层析成像技术对ZrO_2 / ln_2O_3界面的三维化学定量粗糙度

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摘要

The protocol to calculate the chemical roughness from three-dimensional (3-D) data cube acquired by energy-filtered electron tomography has been developed and applied to analyze the 3-D Zr distribution at the arbitrarily shaped interfaces in the ZrO_2/In_2O_3 multilayer films. The calculated root-mean-square roughness quantitatively revealed the chemical roughness at the buried ZrO_2/In_2O_3 interfaces, which is the deviation of Zr distribution from the ideal flat interface. Knowledge of the chemistry and structure of oxide interfaces in 3-D provides information useful for understanding changes in the behavior of a model ZrO_2/In_2O_3 heterostructure that has potential to exhibit mixed conduction behavior.
机译:已经开发了一种通过能量过滤电子断层扫描从三维(3-D)数据立方体中计算化学粗糙度的协议,并将该协议应用于分析ZrO_2 / In_2O_3多层膜中任意形状的界面上的3-D Zr分布。计算出的均方根粗糙度定量地揭示了埋入ZrO_2 / In_2O_3界面处的化学粗糙度,这是Zr分布与理想平面界面的偏差。 3-D中氧化物界面化学和结构的知识为理解ZrO_2 / In_2O_3模型异质结构的行为变化提供了有用的信息,该结构可能具有混合导电行为。

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  • 来源
    《Applied Physics Letters》 |2012年第10期|p.101604.1-101604.4|共4页
  • 作者单位

    Laboratory of Advanced Materials, Department of Materials Science and Engineering, Beijing National Center for Electron Microscopy, Tsinghua University, Beijing 100084, China;

    WR Wiley Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory,Richland, Washington 99352, USA;

    WR Wiley Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory,Richland, Washington 99352, USA;

    Argonne National Laboratory, Materials Science Division, Argonne, Illinois 60439, USA;

    Argonne National Laboratory, Materials Science Division, Argonne, Illinois 60439, USA;

    Argonne National Laboratory, Center for Nanoscale Materials, Argonne, Illinois 60439, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:17:06

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