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A comparison of the carrier density at the surface of quantum wells for different crystal orientations of silicon, gallium arsenide, and indium arsenide

机译:硅,砷化镓和砷化铟不同晶体取向下量子阱表面载流子密度的比较

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摘要

We report the carrier densities at the surface of single-crystal quantum wells as a function of material, orientation, and well width. We include wells constructed from silicon, gallium arsenide, and indium arsenide with three crystal orientations, (100), (110), and (111), included for each material. We find that the Δ_2 states in a silicon (100) quantum well have the smallest density near the surface of the slab. Inspection of the planar average of the carrier densities reveals a characteristic shape that depends on the material and orientation, which leads to a varying degree of suppression or enhancement of the density near the surface. The physics responsible for the suppression or enhancement of the density near the surface can be traced to a constraint imposed by the symmetry of quantum well wavefunction on the phases of the bulk Bloch states of the crystal from which it can be constructed.
机译:我们报告了单晶量子阱表面的载流子密度与材料,取向和阱宽度的关系。我们包括由硅,砷化镓和砷化铟构成的孔,每种材料都包括三个晶体取向(100),(110)和(111)。我们发现,硅(100)量子阱中的Δ_2状态在平板表面附近具有最小的密度。对载流子密度的平面平均值的检查显示出取决于材料和取向的特征形状,这导致表面附近密度的抑制或增强程度不同。负责抑制或提高表面附近密度的物理学可以追溯到由量子阱波函数的对称性对晶体的整体布洛赫(Bloch)态相位构成的约束。

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  • 来源
    《Applied Physics Letters》 |2013年第16期|162107.1-162107.4|共4页
  • 作者

    Ryan Hatcher; Chris Bowen;

  • 作者单位

    Advanced Logic Lab, Samsung Semiconductor R&D Center, 12100 Samsung Blvd., Austin, Texas 78754, USA;

    Advanced Logic Lab, Samsung Semiconductor R&D Center, 12100 Samsung Blvd., Austin, Texas 78754, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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