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Zr/Mg multilayer mirror for extreme ultraviolet application and its thermal stability

机译：极紫外应用的Zr / Mg多层镜及其热稳定性

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摘要

Zr/Mg multilayer mirror was proposed for extreme ultraviolet (EUV) spectral range and deposited by magnetron sputtering. Its thermal stability during annealing up to 600 ℃ was evaluated by EUV reflection measurements, x-ray analyses, and transmission electron microscopy and found superior to that of Y_2O_3/Mg, SiC/Mg, and Co/Mg. The reflectance of as-deposited Zr/Mg multilayer is 30.6% at wavelength of 30.4 nm. The reflectance slightly decreases with annealing temperature when not above 500℃ and eventually drops to 15.1% at 600℃. The degradation of performance is attributed to roughening induced by strain relaxation rather than interdiffusion or alloy compound formation.
机译：提出了Zr / Mg多层镜用于极紫外（EUV）光谱范围，并通过磁控溅射沉积。通过EUV反射测量，X射线分析和透射电子显微镜评估了其在高达600℃的退火过程中的热稳定性，发现其优于Y_2O_3 / Mg，SiC / Mg和Co / Mg。沉积的Zr / Mg多层膜在30.4 nm波长处的反射率为30.6％。当不高于500℃时，反射率随退火温度的升高而略有下降，最终在600℃时下降至15.1％。性能下降归因于应变松弛而不是相互扩散或形成合金化合物而引起的粗糙化。

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  • 来源
    《Applied Physics Letters》 |2013年第11期|111103.1-111103.4|共4页
  • 作者

    Haochuan Li; Jingtao Zhu; Sika Zhou; Zhanshan Wang; Hong Chen; Philippe Jonnard; Karine Le Guen; Jean-Michel Andre;

  • 作者单位

    MOE Key Laboratory of Advanced Micro-structured Materials, Department of Physics, Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;

    MOE Key Laboratory of Advanced Micro-structured Materials, Department of Physics, Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;

    MOE Key Laboratory of Advanced Micro-structured Materials, Department of Physics, Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;

    MOE Key Laboratory of Advanced Micro-structured Materials, Department of Physics, Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;

    MOE Key Laboratory of Advanced Micro-structured Materials, Department of Physics, Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;

    Laboratoire de Chimie Physique-Matiere et Rayonnement, UPMC Univ Paris 06, CNRS UMR 7614,11 rue Pierre et Marie Curie, F-75231 Paris cedex 05, France;

    Laboratoire de Chimie Physique-Matiere et Rayonnement, UPMC Univ Paris 06, CNRS UMR 7614,11 rue Pierre et Marie Curie, F-75231 Paris cedex 05, France;

    Laboratoire de Chimie Physique-Matiere et Rayonnement, UPMC Univ Paris 06, CNRS UMR 7614,11 rue Pierre et Marie Curie, F-75231 Paris cedex 05, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:16:25

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