机译:偏振对四光束激光干涉光刻的影响
JR3CN & CNM, Changchun University of Science and Technology, Changchun 130022, China,JR3CN & Department of Computer Science and Technology, University of Bedfordshire, Luton LU1 3JU, United Kingdom;
JR3CN & CNM, Changchun University of Science and Technology, Changchun 130022, China,JR3CN & Department of Computer Science and Technology, University of Bedfordshire, Luton LU1 3JU, United Kingdom;
JR3CN & CNM, Changchun University of Science and Technology, Changchun 130022, China;
JR3CN & CNM, Changchun University of Science and Technology, Changchun 130022, China,JR3CN & Department of Computer Science and Technology, University of Bedfordshire, Luton LU1 3JU, United Kingdom;
JR3CN & Department of Computer Science and Technology, University of Bedfordshire, Luton LU1 3JU, United Kingdom;
JR3CN & CNM, Changchun University of Science and Technology, Changchun 130022, China,JR3CN & Department of Computer Science and Technology, University of Bedfordshire, Luton LU1 3JU, United Kingdom;
机译:偏振对四光束激光干涉光刻的影响
机译:通过调节飞秒激光偏振的四光束干涉在ZnO上操纵交联的微/纳米光
机译:通过四梁激光干扰光刻在硅中制造的周期性抗反射表面结构
机译:四光束激光干涉平版印刷术产生的图案特征的纳米定位
机译:激光干涉光刻技术,用于大面积构图和功能纳米结构的制造
机译:激光干涉光刻技术在聚二甲基硅氧烷上制备纳米结构
机译:激光通量对四光束激光干涉硅改性的影响
机译:利用氦镉紫外多模激光制备亚微米结构光学材料的干涉光刻性能研究