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Size effects in thin gold films: Discrimination between electron-surface and electron-grain boundary scattering by measuring the Hall effect at 4 K

机译:金薄膜的尺寸效应:通过测量4 K下的霍尔效应来区分电子表面和电子晶粒边界散射

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摘要

We report the Hall effect measured in gold films evaporated onto mica substrates, the samples having an average grain diameter D that ranges between 12 and 174 nm, and a thickness t of approximately 50 nm and 100 nm. The Hall mobility was determined at low temperatures T (4K ≤ T ≤ 50 K). By tuning the grain size during sample preparation, we discriminate whether the dominant collision mechanism controlling the resistivity of the samples at 4 K is electron-surface or electron-grain boundary scattering, based upon whether the Hall mobility depends linearly on film thickness t or on grain diameter D.
机译:我们报告了在蒸发到云母基板上的金膜中测得的霍尔效应,样品的平均粒径D在12至174 nm之间,厚度t约为50 nm至100 nm。在低温T(4K≤T≤50 K)下确定霍尔迁移率。通过调整样品制备过程中的晶粒尺寸,我们可以基于霍尔迁移率线性取决于薄膜厚度t还是基于晶粒直径D

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  • 来源
    《Applied Physics Letters》 |2013年第5期|051608.1-051608.4|共4页
  • 作者单位

    Departamento de Fisica, Universidad Tecnica Federico Santa Maria, Av. Espana 1680, Casilla 110-V, Valparaiso, Chile;

    Departamento de Fisica, Facultad de Ciencias Fisicas y Matematicas, Universidad de Chile, Blanco Encalada 2008, Casilla 487-3, Santiago 8370449, Chile;

    Bachillerato, Universidad de Chile, Las Palmeras 3425, Santiago 7800024, Chile;

    Departamento de Fisica, Facultad de Ciencias Fisicas y Matematicas, Universidad de Chile, Blanco Encalada 2008, Casilla 487-3, Santiago 8370449, Chile;

    Departamento de Fisica, Facultad de Ciencias Fisicas y Matematicas, Universidad de Chile, Blanco Encalada 2008, Casilla 487-3, Santiago 8370449, Chile;

    Departamento de Fisica, Facultad de Ciencias Fisicas y Matematicas, Universidad de Chile, Blanco Encalada 2008, Casilla 487-3, Santiago 8370449, Chile;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 03:16:19

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