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Coherent phonon study of (GeTe)_l(Sb_2Te_3)_m interfacial phase change memory materials

机译:(GeTe)_l(Sb_2Te_3)_m界面相变存储材料的相干声子研究

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摘要

The time-resolved reflectivity measurements were carried out on the interfacial phase change memory (iPCM) materials ([(GeTe)_2(Sb_2Te_3)_4]_8 and [(GeTe)_2(Sb_2Te_3)_1]_(20)) as well as conventional Ge_2Sb_2Te_5 alloy at room temperature and above the RESET-SET phase transition temperature. In the high-temperature phase, coherent phonons were clearly observed in the iPCM samples while drastic attenuation of coherent phonons was induced in the alloy. This difference strongly suggests the atomic rearrangement during the phase transition in iPCMs is much smaller than that in the alloy. These results are consistent with the unique phase transition model in which a quasi-one-dimensional displacement of Ge atoms occurs for iPCMs and a conventional amorphous-crystalline phase transition takes place for the alloy.
机译:时间分辨反射率测量是在界面相变存储(iPCM)材料([(GeTe)_2(Sb_2Te_3)_4] _8和[(GeTe)_2(Sb_2Te_3)_1] _(20)上进行的室温和高于RESET-SET相变温度的常规Ge_2Sb_2Te_5合金。在高温相中,在iPCM样品中清楚地观察到了相干声子,而在合金中引起了相干声子的急剧衰减。这种差异强烈表明,iPCM中相变过程中的原子重排比合金中的重排小得多。这些结果与独特的相变模型一致,在该模型中,iPCM发生了Ge原子的准一维位移,而合金发生了常规的非晶-晶体相变。

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  • 来源
    《Applied Physics Letters》 |2014年第15期|151902.1-151902.4|共4页
  • 作者单位

    Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST),Tsukuba Central 4,1-1-1 Higashi, Tsukuba 305-8562, Japan;

    Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST),Tsukuba Central 4,1-1-1 Higashi, Tsukuba 305-8562, Japan;

    Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST),Tsukuba Central 4,1-1-1 Higashi, Tsukuba 305-8562, Japan;

    Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST),Tsukuba Central 4,1-1-1 Higashi, Tsukuba 305-8562, Japan;

    Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST),Tsukuba Central 4,1-1-1 Higashi, Tsukuba 305-8562, Japan;

    Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST),Tsukuba Central 4,1-1-1 Higashi, Tsukuba 305-8562, Japan;

    Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba 305-8573, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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