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Improved broadband antireflection in Schottky-like junction of conformal Al-doped ZnO layer on chemically textured Si surfaces

机译:化学织构的Si表面上共形Al掺杂ZnO层的肖特基状结中改善的宽带抗反射

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摘要

Chemically textured Si with improved absorption in the complete range of solar spectrum is investigated by ultraviolet/visibleear-infrared (UV/Vis/NIR) spectroscopy, showing an average specular reflectance of ~0.4% in the wavelength of 500-3000 nm. The pyramidal structures on such solar-blind Si can reduce the reflectance further below 0.1% in the UV region by conformal growth of granular Al-doped ZnO (AZO) films. X-ray diffraction analyses suggest the growth of polycrystalline AZO on faceted-Si. Moreover, marginal increase in electrical conductivity of AZO is found on textured surfaces, whereas rise in leakage current in Schottky-like Ag/AZO/Si/Ag heterostructure devices is noticed with increasing Si surface area.
机译:通过紫外/可见/近红外(UV / Vis / NIR)光谱研究了在整个太阳光谱范围内具有改善的吸收率的化学织构化Si,在500-3000 nm波长下,平均镜面反射率为〜0.4%。通过共形生长颗粒状掺Al的ZnO(AZO)薄膜,此类日盲Si上的金字塔结构可以进一步降低UV区的反射率,低于0.1%。 X射线衍射分析表明多晶AZO在刻面Si上生长。此外,在有纹理的表面上发现AZO的电导率略有增加,而随着Si表面积的增加,肖特基型Ag / AZO / Si / Ag异质结构器件的漏电流增加。

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  • 来源
    《Applied Physics Letters》 |2014年第12期|123901.1-123901.4|共4页
  • 作者单位

    Department of Physics, School of Natural Sciences, Shiv Nadar University, Gautam Budh Nagar, Uttar Pradesh 201 314, India;

    Department of Physics, School of Natural Sciences, Shiv Nadar University, Gautam Budh Nagar, Uttar Pradesh 201 314, India;

    SUNAG Laboratory, Institute of Physics, Bhubaneswar 751 005, Odisha, India;

    School of Physical Sciences, National Institute of Science Education and Research, Bhubaneswar 751 005, Odisha, India;

    SUNAG Laboratory, Institute of Physics, Bhubaneswar 751 005, Odisha, India;

    Department of Physics, School of Natural Sciences, Shiv Nadar University, Gautam Budh Nagar, Uttar Pradesh 201 314, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:16:01

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