TEXTURED SURFACE AL-DOPED ZNO-TCOS FILMS FOR SI BASED THIN FILM SOLAR CELLS VIA PLUSED DC MAGNETRON REACTIVE SPUTTERING

摘要

Textured surface aluminum doped zinc oxide (ZnO:Al) thin films were directly deposited via plused direct current (DC) magnetron reactive sputtering on glass substrates. High purity metallic Zn-Al (purity: 99.999%, Al 2 wt.%) target and oxygen (purity: 99.999%) were used as source materials. During the reactive sputtering process, the oxygen gas flow rates were controlled by plasma emission monitoring (PEM). The initially as-grown ZnO:Al films at ～280°C exhibit rough cone-like surface morphology (RMS～65.6 nm) with high transparencies and excellent electrical properties (ρ～3×10~(-4) Ωcm). The natively textured surface ZnO:Al thin films were promising TCOs as substrates for PIN-type a-Si thin film solar cells. Large-area (S＝30 cm×30 cm) textured AZO coated glass substrates for Si thin film solar cells are obtained via magnetron reactive sputtering technique.