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Light trapping in thin-film solar cells measured by Raman spectroscopy

机译:拉曼光谱法测量薄膜太阳能电池中的光阱

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摘要

In this study, Raman spectroscopy is used as a tool to determine the light-trapping capability of textured ZnO front electrodes implemented in microcrystalline silicon (μc-Si:H) solar cells. Microcrystalline silicon films deposited on superstates of various roughnesses are characterized by Raman micro-spectroscopy at excitation wavelengths of 442 nm, 514nm, 633 nm, and 785 nm, respectively. The way to measure quantitatively and with a high level of reproducibility the Raman intensity is described in details. By varying the superstrate texture and with it the light trapping in the μc-Si:H absorber layer, we find significant differences in the absolute Raman intensity measured in the near infrared wavelength region (where light trapping is relevant). A good agreement between the absolute Raman intensity and the external quantum efficiency of the μc-Si:H solar cells is obtained, demonstrating the validity of the introduced method. Applications to thin-film solar cells, in general, and other optoelectronic devices are discussed.
机译:在这项研究中,拉曼光谱用作确定微晶硅(μc-Si:H)太阳能电池中实现的带纹理的ZnO前电极的光捕获能力的工具。通过拉曼显微光谱法分别在442 nm,514 nm,633 nm和785 nm的激发波长下表征沉积在各种粗糙度的超状态上的微晶硅膜。详细介绍了定量测量和高重复性拉曼强度的方法。通过改变上层结构以及随之而来的μc-Si:H吸收层中的光捕获,我们发现在近红外波长区域(与光捕获相关)中测得的绝对拉曼强度存在显着差异。 μc-Si:H太阳能电池的绝对拉曼强度与外部量子效率之间取得了良好的一致性,证明了所引入方法的有效性。讨论了通常在薄膜太阳能电池和其他光电设备中的应用。

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  • 来源
    《Applied Physics Letters》 |2014年第11期|111106.1-111106.4|共4页
  • 作者单位

    Laboratory of Nanostructures and Nanomaterials, Institute of Physics, Academy of Sciences of the Czech Republic, v. v. i., Cukrovarnicka 10,162 00 Prague, Czech Republic,Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federale de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federale de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federale de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

    Laboratory of Nanostructures and Nanomaterials, Institute of Physics, Academy of Sciences of the Czech Republic, v. v. i., Cukrovarnicka 10,162 00 Prague, Czech Republic;

    Laboratory of Nanostructures and Nanomaterials, Institute of Physics, Academy of Sciences of the Czech Republic, v. v. i., Cukrovarnicka 10,162 00 Prague, Czech Republic;

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federale de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

    Laboratory of Nanostructures and Nanomaterials, Institute of Physics, Academy of Sciences of the Czech Republic, v. v. i., Cukrovarnicka 10,162 00 Prague, Czech Republic;

    Photovoltaics and Thin Film Electronics Laboratory, Institute of Microengineering (IMT), Ecole Polytechnique Federale de Lausanne (EPFL), Rue de la Maladiere 71b, CH-2000 Neuchatel, Switzerland;

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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:59

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